The CCS R&D Showerhead Reactor from AIXTRON is a metal organic chemical vapor deposition (MOCVD) system for the growth of nitrides (GaN, AlGaN, InGaN, AlN, etc.).
The system is designed to be extremetly versatile for R&D purposes, as it can allocate wafers of 50 mm, 100 mm, 150 mm and 200 mm in diameter (19×2″, 5×4″, 1x 6″, 1×8″), operating at deposition temperatures up to 1400°C.
The reactor is equipped with several channels for metal organic precursors for the growth and doping, and “in-situ” monitoring tools for real-time temperature control of the wafer, film thickness and bow measurements.
Moreover, the system has been customized to enable in the future the growth of both oxides and 2D materials.
This apparatus will be delivered on September 2023
