The Rapid Thermal Annealing (RTA) system AS-Master S20 HT from Annealsys is a lamp furnace with multi zone control, providing enhanced temperature uniformity and high heating ramps and cooling rates.
The system has a stainless steel water-cooled process chamber, with a horizontal motion of the bedplate, providing easy loading and unloading of the wafers. The AS-Master can process wafers up to 200 mm diameter and allocate in the process chamber susceptors of different size, in order to anneal also small samples. The temperature control is guaranteed by both pyrometer and thermocouple measurements. The fast digital PID temperature controller provides high and stable temperature accuracy.
The system can perform rapid annealing processes in different atmospheres (N2, Ar, O2, N2O). Hence, it is particularly suited for several annealing steps needed during electronic devices processing, e.g. metallization annealing and fast oxidation, in the typycal range 400-1100°C. Ramp rates up to 200°C/s are possible on silicon wafers and 20°C/s when using the susceptor. A high temperature halogen lamp optional feature is available, which can enable processing up to 1450°C.
